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Nano Electronic Devices & Materials Laboratory
º» ¿¬±¸½Ç¿¡¼­´Â Â÷¼¼´ë ·ÎÁ÷ ¼ÒÀÚ, ¸Þ¸ð¸® ¼ÒÀÚ, ´º·Î¸ðÇÈ ¼ÒÀÚ ¹× ½Ã½ºÅÛ, 3Â÷¿ø ÁýÀû ¼ÒÀÚ ºÐ¾ß¿¡¼­ ´Ù¾çÇÑ ÀüÀÚ Àç·á, ¹ÝµµÃ¼ °øÁ¤ ¹× ºÐ¼®À» Ȱ¿ëÇÏ¿© ¿¬±¸¸¦ ¼öÇàÇϰí ÀÖ½À´Ï´Ù. Àç·áÀÇ ¹°¸®/È­ÇÐÀû Ư¼ºÀ» ÀÌÇØÇϰí À̸¦ ¹ÙÅÁÀ¸·Î ¹ÝµµÃ¼ ¼ÒÀÚ¸¦ Á¦ÀÛÇϰí Àü±â/±¤ÇÐ/È­ÇÐ/¹°¸®ÀûÀΠƯ¼ºÀ» ºÐ¼®/ÇØ¼®ÇÕ´Ï´Ù.

Our research activities consist of material, process, device and characterization for various advanced semiconductor devices in logic, memory, neuromorphic and monolithic 3D integration.

Recent News more

  • [Lab Story] Â÷¼¼´ë ¹ÝµµÃ¼ »ê¾÷À» À̲ø ±â¼ú ¿¬±¸, NEDML
    2026-07-13
  • Symposium on VLSI Technology and Circuits ÇÐȸ ¹ßÇ¥!
    2026-07-13

Gallery more

  • 2026³â 4, 5, 6 ¿ù »ýÀÏÆÄÆ¼
    2026-06-29
  • 2026 ½º½ÂÀÇ ³¯
    2026-05-19

Journal more

  • Donguk Kim, Young Seo Na, Yehbeen Im, Kangbaek Seo, Seungchae Lee and Changhwan Choi*, "Plasma-thermal atomic layer etching of molybdenum using CF4 surface fluorination and Ar plasma removal", accepted, Applied Surface Science, 2026

Conference more

  • ÃÖâȯ, "ÇÏÀ̺긮µå º»µù °øÁ¤ ±â¼ú °³¹ß ¹× ÀÀ¿ë [ÃÊû¹ßÇ¥]", ´ëÇÑÀüÀÚ°øÇÐȸ ÇϰèÁ¾ÇÕÇмú´ëȸ, Á¦ÁÖ·Ôµ¥È£ÅÚ, 26.06