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Nano Electronic Devices & Materials Laboratory
º» ¿¬±¸½Ç¿¡¼­´Â Â÷¼¼´ë ·ÎÁ÷ ¼ÒÀÚ, ¸Þ¸ð¸® ¼ÒÀÚ, ´º·Î¸ðÇÈ ¼ÒÀÚ ¹× ½Ã½ºÅÛ, 3Â÷¿ø ÁýÀû ¼ÒÀÚ ºÐ¾ß¿¡¼­ ´Ù¾çÇÑ ÀüÀÚ Àç·á, ¹ÝµµÃ¼ °øÁ¤ ¹× ºÐ¼®À» Ȱ¿ëÇÏ¿© ¿¬±¸¸¦ ¼öÇàÇϰí ÀÖ½À´Ï´Ù. Àç·áÀÇ ¹°¸®/È­ÇÐÀû Ư¼ºÀ» ÀÌÇØÇϰí À̸¦ ¹ÙÅÁÀ¸·Î ¹ÝµµÃ¼ ¼ÒÀÚ¸¦ Á¦ÀÛÇϰí Àü±â/±¤ÇÐ/È­ÇÐ/¹°¸®ÀûÀΠƯ¼ºÀ» ºÐ¼®/ÇØ¼®ÇÕ´Ï´Ù.

Our research activities consist of material, process, device and characterization for various advanced semiconductor devices in logic, memory, neuromorphic and monolithic 3D integration.

Recent News more

  • KCS ÇÐȸ ¿ì¼ö Æ÷½ºÅÍ »ó(±è¼±¹ü, ³ª¿µ¼­, Ȳ±Ô¹Î, À̽Âä, ±èµ¿¿í)
    2026-04-10
  • 2026 KMEPS ÇÐȸ Âü¼® ¹× ¹ßÇ¥
    2026-04-08

Gallery more

  • 2026 ¿¬±¸½Ç Àüü ·¦¹ÌÆÃ
    2026-04-08
  • 2026³â 1, 2, 3¿ù »ýÀÏÆÄÆ¼
    2026-03-29

Journal more

  • Chanseul Lee, Sunbum Kim, Gyulee Kim, Minhyuk Kim, Yongjoo Park, and Changhwan Choi*, "Material and Electrical Characteristics of Thin Film Transistor using Cationic Composition Controlled Atomic Layer Deposited In-Ga-Sn-O (IGTO) Thin Film", ACS Applied Electronic Materials, Vol. 8, p. 1080-1087, 2026

Conference more

  • Changhwan Choi, "How to modulate threshold voltage(Vth) using ALD HKMG Gate Stack for advanced logic transistor and DRAM peripheral transistor", 33ȸ Çѱ¹¹ÝµµÃ¼Çмú´ëȸ (KCS), Á¤¼± ÇÏÀÌ¿ø ±×·£µå È£ÅÚ, 2026.01