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Nano Electronic Devices & Materials Laboratory
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Our research activities consist of material, process, device and characterization for various advanced semiconductor devices in logic, memory, neuromorphic and monolithic 3D integration.

Recent News more

  • ALD/ALE 2025 ÇÐȸ Âü¼®(ÀÓÇöÁø, ÇÑ»ó±¹, ³ª¿µ¼­)
    2025-06-28
  • 2025 VLSI Âü¼®
    2025-06-23

Gallery more

  • 2025³â 4, 5, 6¿ù »ýÀÏÆÄÆ¼
    2025-06-28
  • NEDML µî»ê°¡´Ù!(Àοջê, ºÏ¾Ç»ê)
    2025-06-09

Journal more

  • Chulwon Chung, Kyungsoo Park, Seunghyeon Yun, Junhyeok Park, Hyeon Cheol Jeong, Changhwan Choi*, "The Effects of Inserted layers (HfO2, ZrO2, Y2O3, La2O3) on the Ferroelectric and Synaptic Properties of Zr-doped HfO2 Sandwich Structure", Accepted, Applied Surface Science, 2025

Conference more

  • Hyunjin Lim, Young Seo Na, Yeh Been Im and Changhwan Choi, "Area-Selective Atomic Layer Deposition (AS-ALD) of Ru using Octadecyltrichlorosilane (ODTS) as a Surface Modifier", International Symposium on Semiconductor Devices and Materials (ISSDM), Inha University, Incheon, KOREA, 2024.12